Key Parameters of Pulsed Laser Deposition for Solid Electrolyte Thin Film Growth
Journal: International Journal of Advances in Engineering & Technology (IJAET) (Vol.10, No. 1)Publication Date: 2017-02-01
Authors : Robert Myerlas;
Page : 46-51
Keywords : solid electrolyte; thin films; memory device; pulsed laser deposition (PLD);
Abstract
The pulsed laser deposition (PLD) technique has been a common method to grow thin films such as solid electrolyte (SE). The effects of substrate temperature and laser fluence on the thin film properties and the device performance are analyzed. For the first time, a quantitative analytical model dealing with the energy conversion in the process when laser hits the target is presented, which provides a solution that is crucial in correlating the formation of high quality and uniform thin films to the experimental design. The migration speed of the ablated particles, which determines the quality of the deposited films, is found to be directly related with the laser fluence. Specifically, a threshold fluence is required to generate high purity single form thin film. This model provides the opportunities to improve experimental design and quality control.
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Last modified: 2017-04-07 00:19:28