Optical Properties of Porous Silicon Prepared at Different Etching Times
Journal: International Journal of Macro and Nano Physics (Vol.2, No. 2)Publication Date: 2017-07-18
Authors : Abdulazeez O Mousa Shaymaa H Nawfal;
Page : 1-5
Keywords : Porous silicon; Electrochemical etching; Photoluminescence; PL measurements; Energy gap.;
Abstract
This study presents porous silicon (PSi) samples preparation by electrochemical etching method of p type silicon wafers of 100 degree orientation with different etching time (15, 17, 19, 21)min and with fixed electrolyte solution (40% HF: 99.98% CH3OH) (1:1). The optical property is described by PhotoLuminescence (PL). The PL measurements of PSi samples show that the energy gap increased after the etching process, and all samples exhibit blue shift with the increasing PL intensity
Other Latest Articles
- Structural and Optical Properties of Zinc Doped CdS Thin Films Prepared at Bath Temperature 80ºC by Chemical Bath Deposition Technique
- Poling Effect and Temperature on Electrical Behaviour of PZT-Polymer Composites with 0-3 Connectivity
- Fundamental Properties of Chemical Bath Deposited Bi2S3 Thin Films
- Structural Properties of Vacuum Evaporated ZnS Thin Films
- Thermal Performance of Double Slope Floating Cum Tilted-Wick Solar Still with the Effect of Water Flowing Over the Glass Cover
Last modified: 2018-02-14 22:15:17