The Structural and Surface Morphology Properties of CdO thin films prepared via R.F.magnetron sputtering

ABSTRACT In this paper, CdO thin films having different thicknesses 100, and 200 nm were deposited onto glass substrates by a radio frequency (R.F.) magnetron sputtering process using CdO target under Ar pressure. The sputtering deposition was performed by using R.F. power of 100W. X-ray diffraction (XRD) results suggested that the deposited CdO films were polycrystalline and after annealing becomes single crystal with recognized peak in (111) at 33o. The mean size of crystallization calculated for 100 and 200 nm thin films of CdO before annealing were found to be14.8nm and 24.6 nm respectively. Keywords: - CdO : Thin Film; Nanostructure; Optical; Sputtering RF