Application of Photo Stress Method in the Analysis of Stress around a Notch

The presented paper aims at the analysis of stress fields which occur while applying loads to a photo elastically coated notched sample. The analysis was done by means of Photo Stress method using reflection Polaris cope and digital video camera. On the notched sample subject to loads by eccentric tension we determined the differences of principal normal stresses in specified point at loads 3 kN, In addition, we determined the value of principal normal stress at the edge of the sample during load of 4 kN and 5 kN which was later compared with numerical solution in FEA method ANSYS software. On the photo elastically coated sample we observed maximum elongation of the coating, too. And also by changing the composition of notch specimen do the same and compare the above mention results. Citation:Mr. Sandesh Subhash Awati, PVPIT, BUDHGAON, Sangli; Mr. Ravindra D. Patil ,PVPIT, Budhgaon, Sangli; Mr. Chandrashekhar G. Harge ,PVPIT, Budhgaon, Sangli; Mr. Amar S. Patil ,PVPIT, Budhgaon, Sangli. "Application of Photo Stress Method in the Analysis of Stress around a Notch." Global Research and Development Journal For Engineering 111 2016: 25 - 33.