Chemical Synthesis of Nickel Oxide Thin Film and Study of Structural and Electrochemical Properties

Nickel oxide (NiO) is one of the most positive anode materials for electrochemical supercapacitor. The material is directly deposited on the stainless - steel substrate during the hydrothermal reaction process. Depositions were carried out in temperature range of 80oC to 100oC for 20 hours to 24 hours. Optimized thin films were further characterized for Phase, morphologies, elemental analysis, quantitative compositional information and functional groups were characterized by X- ray diffraction (XRD), scanning electron microscopy (SEM). The specific capacitance of 470 Fg - 1 at scan rate 10 mV/sec was achieved using cyclic voltammetry and 470 Fg - 1 at 1 Ag - 1 current density from galvanostatic charge and discharge curves.