Deposition of Metal-Nanoparticles in Textile Structure by Chemical Reduction Method for UV-Shielding

Now mankind is exposed to danger of UV-radiation (UVR) for health and it is very important to create reliable ways for protection against it. For UVR impact reducing, various shielding materials are used. Special place are occupied by textile screens. Their advantages: flexibility, ability to form shields of various shapes, etc. One of main requirements to UV-screens is their electro-conductivity. To-day various methods of textile materials nano-modification are known (such as evaporation of metals in the electric arc, laser and magnetron sputtering of metals; deposition of nano-particles on the surface of textile materials). Each of methods, as a rule, complicates the technology of textile nano-modification; require high energy costs, lead to different environmental problems, and on synthetic textile materials such treatments cause polymer degradation. The purpose of this work: to elaborate the effective method of textiles modification to receive textiles with high level of protection against UV-radiation. We proposed the method of textile modification in Cu-sulfate solution with Cu-ion reduction for receiving of Cu nano-particles directly in porous textile structure. Textiles modified by using of this method have high degree of ultraviolet waves at wavelengths A (315-400nm) and B (315-280nm). The proposed method is simple, accessible and effective (cheap and accessible reagents; processing may be implemented on the equipment for dyeing).