Nanostructural Properties of Zirconium oxide Thin Films prepared by Magnetron Sputtering

Nanostructure zirconium films are deposited on glass substrate with different thicknesses 85 and 100 nm by R.F.magnetron sputtering. X-ray diffraction (XRD) patterns reveal the formation of polycrystalline ZrO2 films after annealing with average particle size in the range of 13.17 nm and 37.29 nm for thicknesses 85 and 100 nm respectively. The average surface roughness (Ra) measured with atomic force microscopy (AFM) was ranged between 0.425nm and 0.512 nm.