Wettability assessment of Zirconium oxide by Radio Frequency Magnetron sputtering

The aim of this study is to identify the formation of zirconium oxide films by reactive sputtering of chromium target using oxygen and nitrogen as reactive gases along with helium that was used as an inert gas. Zirconium oxide thin films were deposited on glass and silicon substrates by using RF magnetron sputtering process and influence of working pressure was investigated. The structural properties of thin film were characterized by using X-ray diffractometer (XRD). Surface energy and contact angle were explored by using contact angle measuring system. Surface energy and contact angle of thin films increased with increasing pressure from 1.5 to 4.5 Pa and revealed transformation from hydrophilic to hydrophobic behavior of zirconium oxide thin films.