THE THERMAL OXIDATION EFFECT OF THE SINGLE CRYSTAL SILICON (100) ON THE MAGNETIC PROPERTIES OF ULTRA-THIN FILMS OF COBALT

We studied the systems Au/Co (t_Co= 0.7,0.8,and1 nm)/Au deposited on Si and SiO2 by polar magneto-optical Kerr effect magnetometry (PMOKE). Topologies of Si and SiO2 were studied by atomic force microscopy (AFM). We showed that the oxidation of Si induced a change in the evolution of the coercive field and that of the first order of the anisotropy constant according to the thickness of cobalt.