EFFECT OF SOLUTION TEMPERATURE ON VOLTAGE RANGE AND SENSITIVITY OF LOWTEMPERATURE SENSOR CU/NI RESULTS FROM ELECTROPLATING ASSISTED BY PARALLEL MAGNETIC FIELDS
Journal: International Journal of Advanced Research in Engineering and Technology (IJARET) (Vol.11, No. 10)Publication Date: 2020-10-31
Authors : M. Taufiqurrahman Moh. Toifur Ishafit Okimustava Azmi Khusnani;
Page : 333-341
Keywords : Sensitivity; voltage range; thin film Cu/Ni; electroplating; parallel magnetic field;
- EFFECT OF SOLUTION TEMPERATURE ON VOLTAGE RANGE AND SENSITIVITY OF LOWTEMPERATURE SENSOR CU/NI RESULTS FROM ELECTROPLATING ASSISTED BY PARALLEL MAGNETIC FIELDS
- STRUCTURE AND RESISTIVITY OF CU/NI THIN FILM –EFFECTS OF ELECTROPLATING ASSISTED WITH PARALLEL MAGNETIC FIELD ON DEPOSITION TIME VARIATION
- EFFECTS OF ELECTROLYTE CONCENTRATION ON THE VOLTAGE RANGE AND RESPONSE TIME OF CU/NI FILM FOR LOW TEMPERATURE SENSOR
- EFFECT OF CURRENT, TIME, FEED AND CATHODE TYPE ON ELECTROPLATING PROCESS OF URANIUM SOLUTION
- SPECTRAL CHARACTERISTICS OF ULTRAFINE PARTICLES Zn2 SiO4-Mn, PRECIPITATED FROM AN AQUEOUS SOLUTION ON THE SUBSTRATE IN ELECTRIC OR MAGNETIC FIELDS
Abstract
This study aims to identify the effect of solution temperature aided by parallel magnetic fields on the sensitivity and voltage range of the Cu/Ni sensor as a lowtemperature sensor. Solution temperature was varied from 30°C-70°C. The results of data analysis showed that the highest sensitivity is a sensor which is deposited at a temperature of 60°C with a sensitivity level (0.118 ± 0.004) mV/°C with R2= 0.98 and sensor which has the lowest sensitivity sensor with the deposition temperature of 30°C is (0.0004 ± 0.007) mV/°C with R2= 0.96. In contrast to the sensitivity, the highest voltage range is 39.67 mV owned by the sensor which is deposited at 30°C and 60°C while the lowest voltage range is 32.04 mV as a result of the deposition temperature of 40°C.
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