Process Development for Fabrication of Photomasks using LASER Pattern Generator

This paper describes the development of photomaskfabrication process for a wide range of structures written on Chrome blanks using 413 nm wavelength LASER pattern generator. For development of requisite processes, test structures ranging from 0.4 µm to 500 µ min size were designed and fabricated. Apart from the writing process, all other unit processes used for the fabrication of structures were chemical processes which were individually optimized to develop an integrated fabrication process. The process was validated by writing SAW resonator structures comprising of IDT's and reflectors as per the specified tolerances.