Applications of Titania Atomic Layer Deposition in the Biomedical Field and Recent Updates |Biomedgrid

Atomic Layer Deposition (ALD) is a promising technique to precisely deposit nanometer-thick films on inorganic and organic substrates. ALD is known for the deposition of uniform, conformal, and pinhole-free thin films with a controllable thickness with sequential and self-limiting gaseous reactions on the substrate surface of interest. ALD thin films have a wide range of applications, from semiconductor industries to medical devices. In many studies, ALD thin films are used to modify the biomaterial surface properties for particular biomedical applications. Here, polymethyl methacrylate, titanium-based alloys, and collagen were chosen as substrates for this review; thanks to their biocompatibility, these substrates have several applications in the dental, medical, and biomedical fields. The ALD of Titanium (IV) oxide (TiO2) films has been selected for this review as a biocompatible material which has attracted increasing attention in biomedical applications. Selected publications focusing on the modification of the surface of these biomaterials with TiO2 ALD are discussed.