Optical Properties Of As-Deposited Amorphous Carbon Film Fromvarious Substrate Temperaturesvia Custom-Made-CVD

Abstract We were deposited the as-deposited amorphous carbon via a modified custom-made-CVD in the range of 350oC to 550oC at atmospheric pressure with constant of negative bias -40V and argon gas for 1 hour deposition. We used vaporized of palm oil as a carbon source into the chamber. It was observed above 90 of light were transmitted to the samples instead of sample 500oC 80. The as-deposited thin film grown on glass and p-type silicon we found uniform smooth dark grey colored and thickness in the range of 155 to 190nm. It was found thickness less than 170nm brought less significant impact to the reduction of transmission percentage. In relationship with structural image in FESEM the absorption coefficient was found high as the size of particles were big rough and agglomerated. The result showed the optical band gaps for 550oC to 350oC were 0.5eV 1.3eV 0.1eV 0.7eV and 1.4eV respectively. The optical band gaps of 400oC and 350oC were suitable for solar cell applications.