The Effect of Irradiation on Structural and Optical Characteristics of Indium Oxide Thin Films

In2O3 film was obtained by thermal oxidation of indium film under vacuum pressure down 10-4 Torr using tube quartz. The temperature-time oxidation cycle is shown in Figure (1) the condition used in this study to prepare In2O3 was 400C/45min. The X-ray diffraction (XRD) spectrum of the film recorded with X-ray diffractometer operates with 1.5417A monochromatized CuK radiation with Ni filter. The film transmittance was measured in the range (300-900) nm using Shimadzu spectrophotometer.