INFLUENCE OF SUBSTRATE TEMPERATURE ON TIN OXIDE THIN FILMS

A systematic study on the preparation of Tin oxide thin films with variation in the substrate temperature have been conducted to examine the effect of substrate temperature on physical properties of the different synthesized samples of Tin oxide thin films, investigated by X-ray diffraction (XRD), Scanning electron microscopy (SEM), UV-Visible spectrophotometer and Fourier transform infrared spectrometer. From the obtained SEM images, it was found that the surface morphology is considerably affected by increasing the substrate temperature. Structural analysis reveals that in the pattern of the film deposited at a substrate temperature of 4000C, all peaks are sharp and clear. Optical absorption spectra infer that maximum absorption is observed for the film deposited at a substrate temperature of 4000C. The formation of new absorption bands, the change in absorption intensity, and the disappearance of absorption intensity of functional groups are observed from FTIR analysis.