Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure

Discharge characteristics of argon microwave plasma were investigated by using fluid simulation of a MPACVD (Microwave Plasma Assisted Chemical Vapor Deposition) reactor based on finite elements method at low pressure (25-250) Pa. The microwave power was 2.45 GHz TM mode transmitted through the resonant cavity. Microwave power and pressure were considered simulation parameters and argon was used for working gas. A self-consistent fluid model was developed in Comsol Multiphysics Plasma Module for studying the discharge phenomena. The 2D plasma fluid model gives a complete description of spatial-and time evolution of the discharge characteristics such us: electron density and electron temperature. Simulation results show a strong effect of input parameters on the species densities distribution in the plasma.