Spectroscopic Study of BFO Thin Film Deposited on Si (111, 100)

We report the thin film deposition of Bix (FeO3) y (x and y is arbitary number) on Si (111) and Si (100) substrate by Pulse laser deposition technique. X-ray diffraction pattern shows that film deposited on Si (100) substrate do not have any single phase of BFO (BiFeO3) rather it has tendency of amorphous structure. Crystallinity evolved after annealing the films at 600C as the film is deposited on Si (111) substrate. X-ray photoelectron spectroscopy (XPS) study reveals the electronic bonds structure and stoichiometry of Bi and FeO3.