EFFECTS OF ELECTROLYTE CONCENTRATION ON THE VOLTAGE RANGE AND RESPONSE TIME OF CU/NI FILM FOR LOW TEMPERATURE SENSOR
Journal: International Journal of Advanced Research in Engineering and Technology (IJARET) (Vol.11, No. 10)Publication Date: 2020-10-31
Authors : Danurdara Setiamukti Moh. Toifur Ishafit Azmi Khusnani Okimustava;
Page : 350-356
Keywords : Electroplating; parallel magnetic field; Cu/Ni film; voltage range; response time;
Abstract
The Cu/Ni thin film has been made with the electroplating method assisted by magnetic field parallel to electric field on the solution concentration variation. Electrolyte was made from the mixture of H3BO3, NiCl2, NiSO4, and H2O with the content of each component is made more as many as 5 types those are C1-C5. Deposition is carried out using the Ni anode and the Cu cathode installed in the distance of 4 cm, the electrolyte temperature of 60C, 2 minutes under influence of 200G magnetic fields. The characterization was done on the voltage range and the sensor's response time. The result shows that the voltage range is inversely proportional to the response time. Sample of C3 has the smallest range of voltage and the longest response time, while sample of C5 has the greatest range of voltage and the shortest response time.
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